DocumentCode :
1141269
Title :
Fabrication and current-drive of SiGe/Si ´Micro-origami´ epitaxial MEMS device on SOI substrate
Author :
Tokuda, T. ; Sakano, Y. ; Mori, D. ; Ohta, J. ; Nunoshita, M. ; Vaccaro, P.O. ; Vorob´ev, A. ; Kubota, K. ; Saito, N.
Author_Institution :
Graduate Sch. of Mater. Sci., Nara Inst. of Sci. & Technol., Japan
Volume :
40
Issue :
21
fYear :
2004
Firstpage :
1333
Lastpage :
1334
Abstract :
A micromirror structure with SiGe/Si heteroepitaxial layer on a silicon-on-insulator (SOI) substrate using a ´Micro-origami´ technique has been successfully fabricated. The micromirror is supported by two curved hinge structures. The device is driven by application of a current, and net angular displacements larger than 10° (static) and 30° (in resonance) were obtained. These values are comparable with or even larger than the reported values for other MEMS optical switches or beam scanning devices. The experimental results suggest that the movement is evoked by a thermal effect. The Micro-origami device has advantages of low operation voltage smaller than 2 V, and structural compatibility with the Si or SiGe LSIs.
Keywords :
Ge-Si alloys; micromirrors; microswitches; optical switches; semiconductor materials; MEMS optical switches; SOI substrate; Si-SiO2; SiGe; SiGe/Si microorigami epitaxial MEMS device; beam scanning devices; curved hinge structures; micromirror structure; silicon-on-insulator substrate; structural compatibility;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20046143
Filename :
1344883
Link To Document :
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