Title :
Si-based guided-mode resonance filter on a micro-optical bench
Author :
Wang, C.M. ; Chang, J.Y. ; Hsu, C.L. ; Lee, C.C. ; Yang, J.C.
Author_Institution :
Inst. of Opt. Sci., Nat. Central Univ., Jung-Li, Taiwan
Abstract :
An out-of-plane guided-mode resonance filter on a single Si chip using a two-layer polysilicon surface micromachining process has been proposed. To the best of the authors´ knowledge, this is the first time that a monolithic optical filter has been integrated on a silicon micro-optical bench. This device can be used as a bi-directional transceiver filter. The extinction ratio between 1550 and 1310 nm could be as low as 40 dB and the channel passband at 1550 nm was 20 nm.
Keywords :
elemental semiconductors; integrated optics; micro-optics; micromachining; optical fabrication; optical filters; silicon; 1550 to 1310 nm; 40 dB; Si; Si-based guided mode resonance filter; bidirectional transceiver filter; micromachining; monolithic optical filter; silicon micro-optical bench; single Si chip; two-layer polysilicon surface;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20045657