DocumentCode :
1141378
Title :
The effects of impact ionization on the operation of neighboring devices and circuits
Author :
Sakui, Koji ; Wong, S. Simon ; Wooley, Bruce A.
Author_Institution :
Stanford Univ., CA, USA
Volume :
41
Issue :
9
fYear :
1994
fDate :
9/1/1994 12:00:00 AM
Firstpage :
1603
Lastpage :
1607
Abstract :
This paper examines the detrimental effects of excess majority carriers and photons induced by impact ionization on the operation of neighboring pn junctions, bipolar transistors, MOS transistors, and circuits. The experimental results show that in addition to an increase in the substrate surface potential due to the excess majority carriers, photons can lower the barrier of a pn junction and, as a consequence, shift the Gummel plot of an npn bipolar transistor. As for the neighboring circuits, an example in which the speed of an NMOS ring oscillator is retarded by impact ionization in a neighboring NMOS transistor is presented
Keywords :
bipolar transistors; field effect transistor circuits; impact ionisation; insulated gate field effect transistors; p-n junctions; semiconductor junctions; surface potential; Gummel plot; MOS transistors; NMOS ring oscillator; NMOS transistor; excess majority carriers; excess photons; impact ionization; neighboring circuits; neighboring devices; npn bipolar transistor; pn junctions; substrate surface potential; Bipolar transistors; Circuit testing; Diodes; Hot carriers; Impact ionization; MOS devices; MOSFETs; Ring oscillators; Substrate hot electron injection; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.310112
Filename :
310112
Link To Document :
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