High-power pulsed operation of an optimized nonplanar corrugated substrate periodic laser diode array

Author

Bryan, R.P. ; Miller, L.M. ; Cockerill, T.M. ; Langsjoen, S.M. ; Coleman, J.J.

Author_Institution

Compound Semicond. Microelectron. Lab., Illinois Univ., Urbana, IL, USA

Volume

26

Issue

2

fYear

1990

fDate

2/1/1990 12:00:00 AM

Firstpage

222

Lastpage

224

Abstract

High-power pulsed operation of 14.1 W per uncoated facet from an optimized 3-mm-wide (510 μm cavity length) nonplanar corrugated substrate periodic laser diode array is reported. Single-step metalorganic chemical vapor deposition growth over a selectively etched corrugated substrate provides suppressed lateral lasing and amplified spontaneous emission with a minimal number of processing steps. Higher external differential quantum efficiency, slope efficiency, and output power result from a design optimization with regard to the widths of the mesas and grooves of the corrugated substrate

Keywords

chemical vapour deposition; etching; laser cavity resonators; semiconductor junction lasers; semiconductor quantum wells; substrates; superradiance; 14.1 W; 3 mm; 510 micron; amplified spontaneous emission; cavity length; external differential quantum efficiency; graded barrier quantum wells; groove width; high-power operation; mesa width; metalorganic chemical vapor deposition growth; optimized nonplanar corrugated substrate; output power; periodic laser diode array; processing steps; pulsed operation; selectively etched corrugated substrate; single-step CVD growth; slope efficiency; substrate grooves; substrate mesas; suppressed lateral lasing; uncoated facet; Chemical vapor deposition; Design optimization; Diode lasers; Etching; Optical arrays; Optical pulses; Power generation; Pulse amplifiers; Semiconductor laser arrays; Spontaneous emission;

fLanguage

English

Journal_Title

Quantum Electronics, IEEE Journal of

Publisher

ieee

ISSN

0018-9197

Type

jour

DOI

10.1109/3.44952

Filename

44952