DocumentCode :
1141662
Title :
Demonstration of first 9.2 kV 4H-SiC bipolar junction transistor
Author :
Zhang, J. ; Zhao, J.H. ; Alexandrov, P. ; Burke, T.
Author_Institution :
Dept. of Electr. and Comput. Eng., Rutgers Univ., Piscataway, NJ, USA
Volume :
40
Issue :
21
fYear :
2004
Firstpage :
1381
Lastpage :
1382
Abstract :
The first demonstration is reported of a high-voltage (9.2 kV) 4H-SiC bipolar junction transistor (BJT) based on a 50 μm, 7×1014 cm-3 doped drift layer, achieving an emitter current density of 150 A/cm2 at VCEO=5 V, suggesting a specific on-resistance (RSP_ON) of 33 mΩ cm2 without considering current spreading or 49 mΩ cm2 if current spreading is considered. The result far exceeds the previous 4H-SiC BJT record of 3.2 kV with RSP_ON=78 mΩ cm2.
Keywords :
bipolar transistors; current density; electric resistance; silicon compounds; wide band gap semiconductors; 3.2 kV; 4H-SiC bipolar junction transistor; 5 V; 50 micron; 9.2 kV; SiC; drift layer; electric resistance; emitter current density;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:20046223
Filename :
1344914
Link To Document :
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