Title :
Line Edge Detection and Characterization in SEM Images Using Wavelets
Author :
Sun, Wei ; Romagnoli, Jose A. ; Tringe, Joseph W. ; Létant, Sonia E. ; Stroeve, Pieter ; Palazoglu, Ahmet
Author_Institution :
Beijing Univ. of Chem. Technol., Beijing
Abstract :
Edge characterization has become increasingly important in nanotechnology due to the growing demand for precise nanoscale structure fabrication and assembly. Edge detection and assembly. Edge detection is often performed by thresholding the spatial information of a top-down image obtained by scanning electron microscopy or other surface characterization techniques. Results are highly dependent on an arbitrary threshold value, which makes it difficult to reveal the nature of the real surface and to compare results among images. In this paper, we present an alternative edge boundary detection technique based on the wavelet framework. Our results indicate that the method facilitates nanoscale edge detection and characterization by providing a systematic threshold determination step.
Keywords :
edge detection; image segmentation; nanofabrication; photoresists; scanning electron microscopy; semiconductor device measurement; surface roughness; surface topography measurement; wavelet transforms; SEM images; line edge boundary detection technique; nanoscale structure assembly; nanoscale structure fabrication; nanotechnology; photoresist process; roughness characterization; scanning electron microscopy; spatial information; wavelet-based method; Atomic force microscopy; Chemical engineering; Fabrication; Image edge detection; Laboratories; Rough surfaces; Scanning electron microscopy; Sun; Surface roughness; Surface topography; Line edge roughness (LER); scanning electron microscopy (SEM); wavelets;
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
DOI :
10.1109/TSM.2008.2011174