• DocumentCode
    1142861
  • Title

    Dielectric-Barrier Microdischarge Structure for Efficient Positive-Column Plasma Using a Thick-Film Ceramic Sheet

  • Author

    Cho, Tae-Seung ; Shin, Hyea-Weon ; Jung, Jin-Woo

  • Author_Institution
    PDP Dev. Team, Samsung SDI Co., Ltd., Cheonan, South Korea
  • Volume
    37
  • Issue
    8
  • fYear
    2009
  • Firstpage
    1607
  • Lastpage
    1610
  • Abstract
    In this paper, thick-film ceramic-sheet panel as a dielectric-barrier microdischarge-plasma source has been fabricated, and the behaviors of the positive column in the counter-electrode structure have been experimentally observed according to various electrode gaps from 200 to 500 mum . The minimum gap distance between the electrodes, which directly affects the generation of the positive column, was suggested based on the infrared (IR) emission characteristics from the microdischarge plasma. Considering the experimental observations, it is confirmed that the IR efficiency remarkably increases when an efficient positive column is produced at the electrode gaps over 400 mum.
  • Keywords
    discharges (electric); plasma materials processing; plasma sources; sheet materials; dielectric-barrier microdischarge structure; infrared emission; microdischarge plasma; plasma source; positive-column plasma; thick-film ceramic sheet; Dielectric-barrier microdischarge (DBM); infrared (IR) efficiency; positive-column plasma; thick-film ceramic sheet (TFCS);
  • fLanguage
    English
  • Journal_Title
    Plasma Science, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0093-3813
  • Type

    jour

  • DOI
    10.1109/TPS.2009.2024781
  • Filename
    5169963