DocumentCode
1142861
Title
Dielectric-Barrier Microdischarge Structure for Efficient Positive-Column Plasma Using a Thick-Film Ceramic Sheet
Author
Cho, Tae-Seung ; Shin, Hyea-Weon ; Jung, Jin-Woo
Author_Institution
PDP Dev. Team, Samsung SDI Co., Ltd., Cheonan, South Korea
Volume
37
Issue
8
fYear
2009
Firstpage
1607
Lastpage
1610
Abstract
In this paper, thick-film ceramic-sheet panel as a dielectric-barrier microdischarge-plasma source has been fabricated, and the behaviors of the positive column in the counter-electrode structure have been experimentally observed according to various electrode gaps from 200 to 500 mum . The minimum gap distance between the electrodes, which directly affects the generation of the positive column, was suggested based on the infrared (IR) emission characteristics from the microdischarge plasma. Considering the experimental observations, it is confirmed that the IR efficiency remarkably increases when an efficient positive column is produced at the electrode gaps over 400 mum.
Keywords
discharges (electric); plasma materials processing; plasma sources; sheet materials; dielectric-barrier microdischarge structure; infrared emission; microdischarge plasma; plasma source; positive-column plasma; thick-film ceramic sheet; Dielectric-barrier microdischarge (DBM); infrared (IR) efficiency; positive-column plasma; thick-film ceramic sheet (TFCS);
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2009.2024781
Filename
5169963
Link To Document