DocumentCode :
1142861
Title :
Dielectric-Barrier Microdischarge Structure for Efficient Positive-Column Plasma Using a Thick-Film Ceramic Sheet
Author :
Cho, Tae-Seung ; Shin, Hyea-Weon ; Jung, Jin-Woo
Author_Institution :
PDP Dev. Team, Samsung SDI Co., Ltd., Cheonan, South Korea
Volume :
37
Issue :
8
fYear :
2009
Firstpage :
1607
Lastpage :
1610
Abstract :
In this paper, thick-film ceramic-sheet panel as a dielectric-barrier microdischarge-plasma source has been fabricated, and the behaviors of the positive column in the counter-electrode structure have been experimentally observed according to various electrode gaps from 200 to 500 mum . The minimum gap distance between the electrodes, which directly affects the generation of the positive column, was suggested based on the infrared (IR) emission characteristics from the microdischarge plasma. Considering the experimental observations, it is confirmed that the IR efficiency remarkably increases when an efficient positive column is produced at the electrode gaps over 400 mum.
Keywords :
discharges (electric); plasma materials processing; plasma sources; sheet materials; dielectric-barrier microdischarge structure; infrared emission; microdischarge plasma; plasma source; positive-column plasma; thick-film ceramic sheet; Dielectric-barrier microdischarge (DBM); infrared (IR) efficiency; positive-column plasma; thick-film ceramic sheet (TFCS);
fLanguage :
English
Journal_Title :
Plasma Science, IEEE Transactions on
Publisher :
ieee
ISSN :
0093-3813
Type :
jour
DOI :
10.1109/TPS.2009.2024781
Filename :
5169963
Link To Document :
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