Title :
Design of a Polarization-Insensitive Echelle Grating Demultiplexer Based on Silicon Nanophotonic Wires
Author :
Zhu, Ning ; Song, Jun ; Wosinski, Lech ; He, Sailing
Author_Institution :
R. Inst. of Technol., Stockholm
fDate :
5/15/2008 12:00:00 AM
Abstract :
A polarization-insensitive design of an echelle grating (or etched diffraction grating) demultiplexer based on silicon nanowires is proposed in the present letter, by introducing a polarization compensation area in its free propagation region. The polarization-dependent wavelength shift of the present device has been compensated at the whole spectral range. For a design with nine channels and 10-nm channel spacing, when the wavelength shift at the central channel 1550 nm is completely compensated, the wavelength shifts of the two edge channels are only 0.14 and 0.15 nm, which are acceptable.
Keywords :
arrayed waveguide gratings; demultiplexing equipment; elemental semiconductors; nanowires; silicon; silicon-on-insulator; wavelength division multiplexing; Si; etched diffraction grating demultiplexer; polarization compensation; polarization-dependent wavelength shift; polarization-insensitive echelle grating demultiplexer; silicon nanophotonic wires; silicon-on-insulator nanowires; Arrayed waveguide gratings; Diffraction gratings; Electromagnetic waveguides; Etching; Nanowires; Optical waveguides; Polarization; Refractive index; Silicon; Wavelength division multiplexing; Arrayed waveguide grating (AWG); etched diffraction grating (EDG); polarization compensation; silicon-on-insulator (SOI) nanowire; wavelength-division multiplexing (WDM);
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2008.921839