Title :
A double-discharge-initiated HF laser
Author :
Wenzel, R.C. ; Arnold, G.P.
Author_Institution :
Univ. of Calif., Los Alamos Scientific Lab., Los Alamos, NM, USA
fDate :
1/1/1972 12:00:00 AM
Abstract :
A double-discharge hydrogen fluoride chemical laser using SF6+ C4H10and SF6+ H2is described. A maximum pulse energy of 102.5 mJ is reported, with a peak power of about 400 kW. The energy density is 300 mJ/l, and the electrical efficiency is 0.6 percent.
Keywords :
Anodes; Capacitors; Chemical lasers; Gas lasers; Hafnium; Mirrors; Optical pulses; Pulsed laser deposition; Sparks; Voltage;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1972.1076845
