• DocumentCode
    1143630
  • Title

    A double-discharge-initiated HF laser

  • Author

    Wenzel, R.C. ; Arnold, G.P.

  • Author_Institution
    Univ. of Calif., Los Alamos Scientific Lab., Los Alamos, NM, USA
  • Volume
    8
  • Issue
    1
  • fYear
    1972
  • fDate
    1/1/1972 12:00:00 AM
  • Firstpage
    26
  • Lastpage
    27
  • Abstract
    A double-discharge hydrogen fluoride chemical laser using SF6+ C4H10and SF6+ H2is described. A maximum pulse energy of 102.5 mJ is reported, with a peak power of about 400 kW. The energy density is 300 mJ/l, and the electrical efficiency is 0.6 percent.
  • Keywords
    Anodes; Capacitors; Chemical lasers; Gas lasers; Hafnium; Mirrors; Optical pulses; Pulsed laser deposition; Sparks; Voltage;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/JQE.1972.1076845
  • Filename
    1076845
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1143630