Generation and transport of a low-energy intense ion beam

Author

Bystritskii, Vitally ; Garate, Eusebio ; Rostoker, Norman ; Song, Yuanxu ; Van Drie, Allen ; Binderbauer, Michl ; Anderson, Michael ; DeBolt, Nathan ; Walters, James K. ; Morehouse, Mark ; Dettrick, Sean ; Qerushi, Artan ; Matvienko, Vaslly ; Petrov, Anat

Author_Institution

Univ. of California, Irvine, CA, USA

Volume

32

Issue

5

fYear

2004

Firstpage

1986

Lastpage

1992

Abstract

This paper describes experiments on the formation and transport, in vacuum and plasma, of a low-energy (70-120 keV), high-intensity (10-30 A/cm²), long-pulse (0.5-1μs) H⁺ ion beam. The beam was generated in a magnetically insulated diode with an applied radial B-field and active hydrogen-puff plasma source at the anode. The combination of a ballistic focusing large area anode (250 cm²) with a post-cathode toroidal magnetic lens and straight transport solenoid section provided beam transport to a distance of >1 m with an overall efficiency of ≥ 50%. Two-dimensional single-particle computer simulations of the ion´s trajectory in the lens/solenoid system supported optimization of the lens and solenoid parameters.

Keywords

beam handling techniques; hydrogen ions; ion beams; magnetic lenses; particle beam focusing; plasma diodes; plasma sources; plasma transport processes; plasma-beam interactions; 0.5 to 1 mus; 50 percent; 70 to 120 keV; H; ballistic focusing; hydrogen-puff plasma source; ion trajectory; lens parameter optimization; low-energy intense ion beam generation; low-energy intense ion beam transport; magnetically insulated diode; postcathode toroidal magnetic lens; solenoid parameter optimization; transport solenoid; two-dimensional single-particle computer simulations; Anodes; Diodes; Insulation; Ion beams; Lenses; Particle beams; Plasma sources; Plasma transport processes; Solenoids; Toroidal magnetic fields; Ion beam; magnetic lens; magnetically insulated diode; plasma source;

fLanguage

English

Journal_Title

Plasma Science, IEEE Transactions on

Publisher

ieee

ISSN

0093-3813

Type

jour

DOI

10.1109/TPS.2004.835451

Filename

1347253