Title :
An electrothermal microlens scanner with low-voltage large-vertical-displacement actuation
Author :
Jain, A. ; Huikai Xie
Author_Institution :
Dept. of Electr. & Comput. Eng., Univ. of Florida, Gainesville, FL, USA
Abstract :
This letter reports the design, fabrication, and operation of a microlens scanner that can perform large vertical scans at low actuation voltages. Photoresist (PR) reflow technique was used to form a 210-μm-diameter PR microlens on a lens holder which is integrated with a large-vertical-displacement (LVD) microactuator. The lens holder is fabricated using a maskless deep-reactive-ion-etch complementary-metal-oxide-semiconductor microelectromechanical systems process. A maximum static vertical displacement of 280 μm is achieved with a 700 by 320 μm LVD device at a low actuation voltage of 10 V. The microlens has a focal length of 188 μm, a numerical aperture of 0.35, and a resonant frequency of about 1 kHz.
Keywords :
displacement control; microactuators; microlenses; optical design techniques; optical fabrication; optical scanners; optical testing; photoresists; 1 kHz; 10 V; 210 mum; 320 mum; 700 mum; complementary-metal-oxide-semiconductor; electrothermal scanner; large-vertical-displacement actuation; lens holder; low-voltage actuation; maskless deep-reactive-ion etching; microactuator; microelectromechanical systems; microlens scanner; microlens scanner design; microlens scanner fabrication; microlens scanner operation; photoresist reflow; static vertical displacement; Apertures; Electrothermal effects; Fabrication; Lenses; Low voltage; Microactuators; Microelectromechanical systems; Microoptics; Resists; Resonant frequency; Electrothermal actuation; large-vertical-displacement (LVD) microactuator; microelectromechanical systems (MEMS); microlens scanner; optical imaging;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2005.853223
