Title :
Flat-field spectrograph in SiO/sub 2//Si
Author :
Clemens, P.C. ; März, R. ; Reichelt, A. ; Schneider, H.W.
Author_Institution :
Siemens AG, Munich, Germany
Abstract :
The operation of a flat-field spectrograph in silica glass on silicon (SiO/sub 2//Si) as a demultiplexer with 4-nm channel spacing in the 1.5- mu m waveguide length region is demonstrated. The concept allows fabrication tolerances to be compensated simultaneously with the adjustment of fan-out. Fiber-to-fiber insertion loss of 10.1 dB and crosstalk attenuation >15 dB have been achieved.<>
Keywords :
infrared spectroscopy; integrated optics; multiplexing equipment; optical communication equipment; optical losses; silicon; silicon compounds; 1.5 micron; 10.1 dB; 15 dB; IR; SiO/sub 2/-Si; channel spacing; crosstalk attenuation; demultiplexer; fabrication tolerances; fan-out; fibre-to-fibre insertion loss; flat-field spectrograph; reflection gratings; silica glass; Arrayed waveguide gratings; Channel spacing; Etching; Fabrication; Insertion loss; Optical attenuators; Optical crosstalk; Optical reflection; Optical waveguides; Wavelength measurement;
Journal_Title :
Photonics Technology Letters, IEEE
