DocumentCode :
1146798
Title :
Extraction of defect size distributions in an IC layer using test structure data
Author :
Khare, Jitendra B. ; Maly, Wojciech ; Thomas, Michael E.
Author_Institution :
Dept. of Electr. & Comput. Eng., Carnegie Mellon Univ., Pittsburgh, PA, USA
Volume :
7
Issue :
3
fYear :
1994
fDate :
8/1/1994 12:00:00 AM
Firstpage :
354
Lastpage :
368
Abstract :
This paper demonstrates the need for specialized test structures and algorithms to obtain defect characteristics which are necessary for accurate yield prediction. Using one such specialized test structure, a general methodology for extracting size distribution parameters for both shorts and opens in any IC layer, which is independent of defect and yield models, is developed in this paper. The application of this methodology is illustrated by means of a fabrication experiment
Keywords :
integrated circuit manufacture; integrated circuit testing; production testing; statistical analysis; IC layer; defect size distributions; fabrication; opens; shorts; test structure data; yield prediction; Circuit faults; Contamination; Data mining; Fabrication; Helium; Integrated circuit modeling; Integrated circuit testing; Manufacturing; Modems; Terminology;
fLanguage :
English
Journal_Title :
Semiconductor Manufacturing, IEEE Transactions on
Publisher :
ieee
ISSN :
0894-6507
Type :
jour
DOI :
10.1109/66.311339
Filename :
311339
Link To Document :
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