DocumentCode :
1147539
Title :
Effect of surface inhomogeneities on the electrical characteristics of SiC Schottky contacts
Author :
Bhatnagar, Mohit ; Baliga, B. Jayant ; Kirk, H.R. ; Rozgonyi, G.A.
Author_Institution :
Phoenix Corporate Res. Lab., Motorola Inc., Tempe, AZ, USA
Volume :
43
Issue :
1
fYear :
1996
fDate :
1/1/1996 12:00:00 AM
Firstpage :
150
Lastpage :
156
Abstract :
This paper reports analysis of the role of defects on the electrical characteristics of high-voltage 6H-SiC Schottky rectifiers. The measured reverse leakage current of high-voltage Ti and Pt rectifiers was found to be much higher than that predicted by thermionic emission theory and using a barrier height extracted from the C-V measurements. In this paper, a model based upon the presence of defects at the 6H-SiC/metal interface is used to explains this behavior. It is proposed that these defects result in lowering of the barrier height in the localized regions and thus, significantly affect the reverse I-V characteristics of the Schottky contacts. The presence of electrically active defects in the Schottky barrier area has been verified by EBIC studies
Keywords :
EBIC; Schottky barriers; Schottky diodes; leakage currents; platinum; semiconductor device models; semiconductor-metal boundaries; silicon compounds; solid-state rectifiers; titanium; wide band gap semiconductors; 6H-SiC Schottky rectifiers; EBIC studies; HV diodes; Pt contact; Pt-SiC; SiC/metal interface; Ti contact; Ti-SiC; barrier height lowering; electrical characteristics; electrically active defects; high-voltage rectifiers; localized regions; model; reverse I-V characteristics; reverse leakage current; surface inhomogeneities; Current measurement; Electric variables; Electron mobility; Kirk field collapse effect; Leakage current; Rectifiers; Schottky barriers; Schottky diodes; Silicon carbide; Voltage;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.477606
Filename :
477606
Link To Document :
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