DocumentCode :
1148340
Title :
Hydrogen atom sources for electrically pulsed hydrogen halide lasers
Author :
Wolga, G.
Author_Institution :
Cornell Univ., Ithaca, NY
Volume :
9
Issue :
1
fYear :
1973
fDate :
1/1/1973 12:00:00 AM
Firstpage :
193
Lastpage :
193
Abstract :
With the aim of optimizing the performance of electrical discharge pulsed high-pressure hydrogen halide lasers, we have investigated the effects of over forty chemicals on these systems. We have examined those compounds for which the chain carrying step, X + HR under\\rightarrow{(1)} RX + H (X = Br, Cl, or F) promised to be more exothermic than the corresponding step with the usual fuels (i.e., R = H or a simple hydrocarbon radical). In the case of the less reactive halogens, production of hydrogen atoms in a nonchain reaction, directly initiated by the discharge, may well compete or dominate reaction (1) on the time scale of the lasing pulse. Because of this and the low electron temperature associated with high pressure discharges in electronegative gases, we have examined chemicals that contain a weakly bound hydrogen or a weakly bound, but highly reactive radical that could react in a second step to yield hydrogen atoms. These could then react in the lasing step, H + XR\´ → HX + R\´, to give vibrationally excited HX. Chemicals used included H2S, H2O2, highly chlorinated alkanes, alkines, and aldehydes, hydrazine, silane, and several substituted derivatives thereof. Helium and argon which improve discharge characteristics were also studied. The reaction was initiated by a 30-kV electric discharge from an array of needle electrodes, each resistively ballasted. The halogen sources used were the usual Br2, Cl2, and SF6. Results such as the enhancement of HBr lasing in a H2+ Br2mixture upon the addition of O2but not upon the addition of N2can only be explained in terms of the ensuing chemical reactions and will be discussed.
Keywords :
Atom lasers; Atomic beams; Atomic measurements; Chemical lasers; Fault location; Fuels; Hydrocarbons; Hydrogen; Optical pulses; Production;
fLanguage :
English
Journal_Title :
Quantum Electronics, IEEE Journal of
Publisher :
ieee
ISSN :
0018-9197
Type :
jour
DOI :
10.1109/JQE.1973.1077315
Filename :
1077315
Link To Document :
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