DocumentCode
1148717
Title
Wear of Polysilicon Surface Micromachines Operated in High Vacuum
Author
Timpe, Shannon J. ; Alsem, Daan Hein ; Hook, D. Adam ; Dugger, Michael T. ; Komvopoulos, Kyriakos
Author_Institution
Dow Chem. Co., Midland, MI
Volume
18
Issue
2
fYear
2009
fDate
4/1/2009 12:00:00 AM
Firstpage
229
Lastpage
238
Abstract
The evolution of wear at sidewall surfaces of polysilicon microelectromechanical systems was investigated in high vacuum under controlled normal load and sliding speed conditions. The static adhesion force was used as an indicator of the changes in wear characteristics occurring during oscillatory sliding contact. Measurements of the static adhesion force as a function of sliding cycles and scanning electron microscopy observations of micromachines from the same batch process subjected to nominally identical testing conditions revealed two distinctly different tribological patterns, namely, low-adhesion/high-wear behavior and high-adhesion/low-wear behavior. The static adhesion force and wear behavior were found to be in direct correlation with the micromachine operational lifetime. Transmission electron microscopy, selected area diffraction, and energy dispersive X-ray spectroscopy yielded insight into the origin, microstructure, and composition of wear debris and agglomerates adhered onto the sliding surfaces. Results demonstrate a strong dependence of micromachine operational life on the removal of the native oxide film and the organic monolayer coating as well as the formation of agglomerates consisting of organic coating material and wear debris.
Keywords
adhesion; micromechanical devices; silicon; sliding friction; small electric machines; wear; Si; agglomerates; energy dispersive X-ray spectroscopy; oscillatory sliding contact; polysilicon surface micromachines; scanning electron microscopy; selected area diffraction; static adhesion force; transmission electron microscopy; wear; Adhesion; agglomeration; micromachine lifetime; organic monolayer coating; oscillatory sliding; oxide film; wear behavior; wear debris;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2008.2010851
Filename
4776492
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