DocumentCode
1149719
Title
Performance potential of silicon bipolar transistors
Author
Marksteiner, S. ; Felder, A. ; Meister, T.F.
Author_Institution
Siemens AG, Munich, Germany
Volume
28
Issue
9
fYear
1992
fDate
4/23/1992 12:00:00 AM
Firstpage
812
Lastpage
814
Abstract
The performance potential of silicon bipolar transistors is investigated by device simulation. Using a one-dimensional drift-diffusion equation solver, the SPICE parameters of self-aligned transistors are extracted from doping profiles and device geometries. These parameters are used to predict the CML gate delay for different doping profiles. The validity of this extraction procedure is verified by comparison with experimental data. For a double-diffusion type doping profile with a pinch resistance of 15 k Omega / Square Operator , a transit frequency of 56 GHz and a CML gate delay of approximately 15 ps are achievable. With a doping profile including a low-doped emitter region and a high base doping concentration, significant improvements are found: A transit frequency of 81.6 GHz and a pinch resistance of 10 k Omega / Square Operator enable CML gate delay times below 10 ps.
Keywords
bipolar transistors; delays; doping profiles; electronic engineering computing; semiconductor device models; solid-state microwave devices; 10 ps; 15 ps; 56 GHz; 81.6 GHz; CML gate delay; SPICE parameters; Si; bipolar transistors; device simulation; doping profiles; double-diffusion type doping profile; high base doping concentration; low-doped emitter region; one-dimensional drift-diffusion equation solver; performance potential; pinch resistance; self-aligned transistors; transit frequency;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:19920514
Filename
135109
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