Title :
A high-repetition-rate chemical HF laser
Author :
Jacobson, T.V. ; Kimbell, G.H. ; Snelling, D.R.
Author_Institution :
Defense Research Establishment Valcartier, Courcelette, Que., Canada
fDate :
4/1/1973 12:00:00 AM
Abstract :
An HF chemical laser with a 10-cm-long active volume has been constructed for operation at high pulse repetition rates using TE excitation. Up to 7.2 W of quasi-CW power were produced at 1100 Hz. Powers as high as 160 mW were obtained on a single transition when the cavity was line tuned. The effect of sequential or cascade lasing was observed.
Keywords :
Chemical lasers; Hafnium; Laser modes; Laser transitions; Mirrors; Optical pulse shaping; Optical pulses; Power lasers; Pump lasers; Voltage;
Journal_Title :
Quantum Electronics, IEEE Journal of
DOI :
10.1109/JQE.1973.1077503
