• DocumentCode
    1151595
  • Title

    Investigations of whisper gallery mirrors for extreme ultraviolet (EUV) and soft X-rays

  • Author

    Hung, Tsen-Yu ; Hagelstein, Peter L.

  • Author_Institution
    Res. Lab. of Electron., MIT, Cambridge, MA, USA
  • Volume
    28
  • Issue
    5
  • fYear
    1992
  • fDate
    5/1/1992 12:00:00 AM
  • Firstpage
    1376
  • Lastpage
    1383
  • Abstract
    The authors have examined optical constants and predicted reflectivities of candidate surface coatings for whisper gallery mirrors (WGMs) in the extreme ultraviolet. The spectral regime near 100-150 Å has been identified in the literature as particularly promising due to the high WGM reflectivities of the noble metals in the vicinity of their Cooper minima in this regime. The authors confirm this basic result using newer EUV optical data, and they have sought candidate surface materials which would extend the range over which WGMs may be used to longer wavelengths. It is found that substantial WGM reflectivities are predicted for a variety of elements in the EUV, and that TE peak reflection is larger than TM peak reflection by on the order of 10%; however, most of the elements which do reflect well have surfaces which are vulnerable to oxygen contamination
  • Keywords
    X-ray optics; mirrors; optical constants; optical films; reflectivity; Cooper minima; O contamination; extreme ultraviolet; noble metals; optical constants; reflectivities; soft X-rays; spectral regime; surface coatings; surface materials; whisper gallery mirrors; Coatings; Mirrors; Optical materials; Optical reflection; Optical surface waves; Reflectivity; Surface contamination; Surface waves; Tellurium; Ultraviolet sources;
  • fLanguage
    English
  • Journal_Title
    Quantum Electronics, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9197
  • Type

    jour

  • DOI
    10.1109/3.135280
  • Filename
    135280