DocumentCode
1151595
Title
Investigations of whisper gallery mirrors for extreme ultraviolet (EUV) and soft X-rays
Author
Hung, Tsen-Yu ; Hagelstein, Peter L.
Author_Institution
Res. Lab. of Electron., MIT, Cambridge, MA, USA
Volume
28
Issue
5
fYear
1992
fDate
5/1/1992 12:00:00 AM
Firstpage
1376
Lastpage
1383
Abstract
The authors have examined optical constants and predicted reflectivities of candidate surface coatings for whisper gallery mirrors (WGMs) in the extreme ultraviolet. The spectral regime near 100-150 Å has been identified in the literature as particularly promising due to the high WGM reflectivities of the noble metals in the vicinity of their Cooper minima in this regime. The authors confirm this basic result using newer EUV optical data, and they have sought candidate surface materials which would extend the range over which WGMs may be used to longer wavelengths. It is found that substantial WGM reflectivities are predicted for a variety of elements in the EUV, and that TE peak reflection is larger than TM peak reflection by on the order of 10%; however, most of the elements which do reflect well have surfaces which are vulnerable to oxygen contamination
Keywords
X-ray optics; mirrors; optical constants; optical films; reflectivity; Cooper minima; O contamination; extreme ultraviolet; noble metals; optical constants; reflectivities; soft X-rays; spectral regime; surface coatings; surface materials; whisper gallery mirrors; Coatings; Mirrors; Optical materials; Optical reflection; Optical surface waves; Reflectivity; Surface contamination; Surface waves; Tellurium; Ultraviolet sources;
fLanguage
English
Journal_Title
Quantum Electronics, IEEE Journal of
Publisher
ieee
ISSN
0018-9197
Type
jour
DOI
10.1109/3.135280
Filename
135280
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