DocumentCode
1151927
Title
High-temperature (T=490 K) operation of 5.8 μm quantum cascade lasers with InP/GaInAs waveguides
Author
Friedrich, A. ; Scarpa, G. ; Boehm, G. ; Amann, M.-C.
Author_Institution
Walter-Schottky Inst., Tech. Univ. Muenchen, Garching, Germany
Volume
40
Issue
22
fYear
2004
Firstpage
1416
Lastpage
1417
Abstract
5.8 μm Ga0.4In0.6As/Al0.56In0.44As strain-compensated quantum-cascade lasers with InP and GaInAs cladding layers using solid-source molecular-beam epitaxy have been fabricated. Low threshold current densities and high-temperature operation of uncoated devices, with a record value of 490 K, have been achieved in pulsed mode.
Keywords
III-V semiconductors; aluminium compounds; claddings; current density; gallium arsenide; indium compounds; quantum cascade lasers; semiconductor epitaxial layers; semiconductor growth; solid phase epitaxial growth; waveguides; 490 K; 5.8 μm quantum cascade lasers; 5.8 micron; GaInAs cladding layers; GaInAs-AlInAs; InP cladding layers; InP-GaInAs; InP/GaInAs waveguides; high-temperature operation; solid-source molecular-beam epitaxy; strain-compensated quantum-cascade lasers; threshold current densities;
fLanguage
English
Journal_Title
Electronics Letters
Publisher
iet
ISSN
0013-5194
Type
jour
DOI
10.1049/el:20040604
Filename
1352860
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