DocumentCode :
1152100
Title :
Quasi-TEM study of microshield lines with practical cavity sidewall profiles
Author :
Cheng, Kwok-Keung M. ; Robertson, Ian D.
Author_Institution :
Dept. of Electron. & Electr. Eng., King´´s Coll., London, UK
Volume :
43
Issue :
12
fYear :
1995
fDate :
12/1/1995 12:00:00 AM
Firstpage :
2689
Lastpage :
2694
Abstract :
This paper presents the quasi-TEM characteristics of microshield lines with practical cavity sidewall profiles. A conformal mapping method is used for the derivation of the electrical parameters of the structures. In this study, numerical results for the characteristic impedances of air-suspended microshield lines with both positive and negative sidewall slopes are presented. Simple and explicit CAD-oriented expressions are proposed for the design and analysis of rectangular-shaped microshield line. Comparisons are made between the results obtained by these formulas and by a standard numerical technique. Furthermore, the sensitivities of the electrical parameters of a rectangular-shaped microshield line to an imperfect sidewall etching process, leading to nonvertical sidewall profiles, are also examined
Keywords :
electromagnetic shielding; microstrip lines; transmission line theory; CAD; air-suspended microshield line; cavity sidewall profiles; characteristic impedances; conformal mapping; design; electrical parameters; etching; numerical technique; quasi-TEM characteristics; rectangular-shaped microshield line; Biomembranes; Conductors; Conformal mapping; Dielectric substrates; Electromagnetic radiation; Fabrication; Impedance; Microstrip; Sensitivity analysis; Wet etching;
fLanguage :
English
Journal_Title :
Microwave Theory and Techniques, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9480
Type :
jour
DOI :
10.1109/22.477845
Filename :
477845
Link To Document :
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