• DocumentCode
    1152480
  • Title

    Improvement of resistance characteristics of NiCr thin film by gradational double annealing process

  • Author

    Kim, N.-H. ; Kwon, Y. ; Park, J. ; Choi, G.-P.

  • Author_Institution
    Res. Inst. of Energy Resources Technol., Chosun Univ., Gwangju, South Korea
  • Volume
    41
  • Issue
    17
  • fYear
    2005
  • Firstpage
    982
  • Lastpage
    984
  • Abstract
    Gradational double annealing treatment improved the resistance characteristics of NiCr thin film enough to achieve sufficient thermal characteristics of an NiCr thin film heater by suppression of oxides and formation of large Ni-metal, small Ni-oxide, and little Cr-metal in the surface.
  • Keywords
    annealing; chromium alloys; electrical resistivity; metallic thin films; nickel alloys; NiCr; gradational double annealing process; gradational double annealing treatment; oxide suppression; resistance characteristics; thermal characteristics; thin film;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el:20052343
  • Filename
    1500298
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=1152480