Title :
Improvement of resistance characteristics of NiCr thin film by gradational double annealing process
Author :
Kim, N.-H. ; Kwon, Y. ; Park, J. ; Choi, G.-P.
Author_Institution :
Res. Inst. of Energy Resources Technol., Chosun Univ., Gwangju, South Korea
Abstract :
Gradational double annealing treatment improved the resistance characteristics of NiCr thin film enough to achieve sufficient thermal characteristics of an NiCr thin film heater by suppression of oxides and formation of large Ni-metal, small Ni-oxide, and little Cr-metal in the surface.
Keywords :
annealing; chromium alloys; electrical resistivity; metallic thin films; nickel alloys; NiCr; gradational double annealing process; gradational double annealing treatment; oxide suppression; resistance characteristics; thermal characteristics; thin film;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20052343
