DocumentCode :
1152648
Title :
A new method to determine the MOSFET effective channel width
Author :
Arora, Narain D. ; Bair, Lawrence A. ; Richardson, Llanda M.
Author_Institution :
Digital Equipment Corp., Hudson, MA, USA
Volume :
37
Issue :
3
fYear :
1990
fDate :
3/1/1990 12:00:00 AM
Firstpage :
811
Lastpage :
814
Abstract :
A method of determining the effective channel width of a MOSFET device that is simple and accurate is discussed. While simple, this method takes the width-dependent series resistance of MOSFETs into account, which has not been done in previous methods. The results correlate well with SEM cross section measurements. In addition, the method is applicable to current scaled MOSFETs, requiring no measurements outside the normal operating range of the devices being characterized
Keywords :
insulated gate field effect transistors; semiconductor device testing; MOSFET; SEM cross section measurements; channel width determination method; current scaled devices; effective channel width; width-dependent series resistance; Bipolar transistors; Capacitance measurement; Capacitance-voltage characteristics; Electrical resistance measurement; Gallium arsenide; Heterojunctions; Indium gallium arsenide; Indium phosphide; MOSFET circuits; Molecular beam epitaxial growth;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.47793
Filename :
47793
Link To Document :
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