Title :
Coupling and crosstalk between high speed interconnects in ultralarge scale integrated circuits
Author :
Bandyopadhyay, Supriyo
Author_Institution :
Dept. of Electr. Eng., Notre Dame Univ., IN, USA
fDate :
6/1/1992 12:00:00 AM
Abstract :
The advent of sophisticated lithographic techniques has made it possible to fabricate densely packed ultra-large-scale-integrated (ULSI) circuits. In these chips, interconnect lines are so narrow and spaced in such close proximity that signal from one line could easily get coupled to another, causing interference and crosstalk. A general theory to model coupling between optical interconnects (waveguides) and quantum-mechanical coupling between narrow and very closely spaced silicide interconnects embedded in dielectrics (SiO2) is presented
Keywords :
VLSI; crosstalk; integrated circuit technology; integrated optoelectronics; metallisation; optical interconnections; SiO2; coupling; crosstalk; dielectrics; general theory; high speed interconnects; interconnect lines; interference; nanotechnology; optical interconnects; quantum-mechanical coupling; silicide interconnects; sophisticated lithographic techniques; ultralarge scale integrated circuits; Coupling circuits; Crosstalk; Integrated circuit interconnections; Interference; Optical coupling; Optical interconnections; Optical waveguide theory; Optical waveguides; Quantum mechanics; Ultra large scale integration;
Journal_Title :
Quantum Electronics, IEEE Journal of
