DocumentCode :
1153244
Title :
Experimental Investigation on the Quasi-Ballistic Transport: Part II—Backscattering Coefficient Extraction and Link With the Mobility
Author :
Barral, Vincent ; Poiroux, Thierry ; Munteanu, Daniela ; Autran, Jean-Luc ; Deleonibus, Simon
Author_Institution :
CEA-Lab. d´´Electron. et Technol. de´´ Inf., MINATEC, Grenoble
Volume :
56
Issue :
3
fYear :
2009
fDate :
3/1/2009 12:00:00 AM
Firstpage :
420
Lastpage :
430
Abstract :
Using a new extraction methodology taking into account multisubband population and carrier degeneracy, we have experimentally determined backscattering coefficients, ballistic ratios, and injection velocities of n- and p-FDSOI devices with gate lengths down to 30 nm in the saturated and, for the first time, in the linear regimes. The evolution of these quasi-ballistic parameters is examined as a function of the inversion charge in the channel and at temperatures ranging from 50 to 293 K, showing stronger ballistic ratios in the saturated regime than in the linear one. We particularly focus on the linear regime, and a model linking ballisticity ratios and effective mobility is proposed and validated experimentally for different gate lengths. According to the experimental evaluation of the device mean-free path and its evolution with both the inversion charge in the channel and the temperature, we investigate the mobility degradation with decreasing gate lengths, highlighting the importance of Coulomb scattering on this unexpected mobility behavior.
Keywords :
MOSFET; electron backscattering; feature extraction; silicon-on-insulator; Coulomb scattering; SOI MOSFET; backscattering coefficient extraction; mean-free path; mobility degradation; n-FDSOI devices; p-FDSOI devices; quasi-ballistic transport; size 30 nm; temperature 50 K to 293 K; Backscatter; Degradation; Electrostatics; Joining processes; Laboratories; MOSFETs; Microelectronics; Scattering; Silicon on insulator technology; Temperature distribution; Backscattering coefficient; SOI MOSFETs; ballistic ratio; injection velocity; linear regime; mean-free path; mobility;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2008.2011682
Filename :
4781549
Link To Document :
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