DocumentCode :
1154120
Title :
Post growth tailoring of the optical properties of GaAs-AlGaAs multiple quantum wells
Author :
Ghisoni, M. ; Gibson, M. ; Rivers, A. ; Boyd, I.W. ; Parry, Guillaume ; Roberts, Jeffrey S.
Author_Institution :
Dept. of Electron. & Electr. Eng., Univ. Coll. London, UK
Volume :
26
Issue :
14
fYear :
1990
fDate :
7/5/1990 12:00:00 AM
Firstpage :
1058
Lastpage :
1059
Abstract :
The post-growth bandgap engineering of a fifty period multiple quantum well is reported. A controlled blue shift of the band edge is achieved through the deposition of a SiOx encapsulant followed by rapid thermal annealing giving shifts of up to 16 meV. The expected depth dependence of this process is not observed and thus the blue shifted samples retain clearly resolved room temperature excitonic features and preserve the quantum confined Stark effect.
Keywords :
III-V semiconductors; Stark effect; aluminium compounds; annealing; gallium arsenide; optoelectronic devices; semiconductor quantum wells; GaAs-AlGaAs; MQW; RTA; SiO x encapsulant; bandgap tailoring; controlled blue shift; multiple quantum wells; optical properties; post-growth bandgap engineering; quantum confined Stark effect; rapid thermal annealing; room temperature excitonic features; semiconductors;
fLanguage :
English
Journal_Title :
Electronics Letters
Publisher :
iet
ISSN :
0013-5194
Type :
jour
DOI :
10.1049/el:19900685
Filename :
108014
Link To Document :
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