DocumentCode :
1154445
Title :
Giant magnetoresistance and antiferromagnetically coupled Co fraction in Co/Cu multilayers with varying number of periods
Author :
van den Berg, H.A.M. ; Rupp, G.
Author_Institution :
Corp. Res. & Dev., Siemens AG, Erlangen, Germany
Volume :
30
Issue :
2
fYear :
1994
fDate :
3/1/1994 12:00:00 AM
Firstpage :
809
Lastpage :
811
Abstract :
The giant magnetoresistive signal of Co/Cu multilayers as a function of the number NCo of Co layers is experimentally investigated for Cu thicknesses of 1 nm, i.e. in the 1st antiferromagnetic maximum, and for Co layer thickness of 1 nm. The stacks were deposited by DC magnetron sputtering on an Fe buffer. The fraction FAF of the film that couples antiferromagnetically is derived from the hysteresis curves. A correction of FAF is required for the buffer and one Co layer. The FAF of stack periods close to the buffer is about 1, while FAF reduces at large stack thicknesses. The GMR of stacks with small thicknesses is limited by the diffuse scattering at the outer surfaces. The GMR of thicker stacks depends on FAF and the resistivity. Furthermore, the meaning of FAF is discussed. By optimizing N Co, we achieved Δρ/ρ´s as high as 72% at room temperature
Keywords :
antiferromagnetic properties of substances; cobalt; copper; magnetic hysteresis; magnetic multilayers; magnetoresistance; sputtered coatings; 293 K; Co-Cu; Co/Cu multilayers; DC magnetron sputtering; Fe; Fe buffer; antiferromagnetic maximum; antiferromagnetically coupled Co fraction; diffuse scattering; giant magnetoresistance; hysteresis curves; resistivity; room temperature; stack periods; Antiferromagnetic materials; Conductivity; Couplings; Giant magnetoresistance; Hysteresis; Iron; Magnetic multilayers; Scattering; Sputtering; Temperature;
fLanguage :
English
Journal_Title :
Magnetics, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9464
Type :
jour
DOI :
10.1109/20.312416
Filename :
312416
Link To Document :
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