Title :
Monolithic integration of continuous-relief diffractive structures with vertical-cavity surface-emitting lasers
Author :
Karlsson, M. ; Nikolajeff, F. ; Vukusic, J. ; Martinsson, H. ; Bengtsson, J. ; Larsson, A.
Author_Institution :
Angstrom Lab., Uppsala Univ., Sweden
fDate :
3/1/2003 12:00:00 AM
Abstract :
In this work, we have studied the transfer of diffractive optical elements (DOEs), originally made in resist, into GaAs for monolithic integration with vertical-cavity surface-emitting lasers (VCSELs). The DOEs are blazed gratings and Fresnel lenses, and have been fabricated on the back surface of bottom emitting VCSELs using electron-beam lithography or replication by hot embossing in resist followed by a quick-dry etch step. Diffraction efficiency was measured to be 81% in the first order of diffraction for the blazed grating.
Keywords :
diffraction gratings; diffractive optical elements; electron resists; integrated optoelectronics; lenses; optical fabrication; semiconductor lasers; surface emitting lasers; 81 percent; Fresnel lenses; VCSELs; back surface; blazed grating; blazed gratings; bottom emitting VCSELs; continuous-relief diffractive structures; diffraction efficiency; diffractive optical elements; electron-beam lithography; first order diffraction; hot embossing; monolithic integration; quick-dry etch step; replication; resist; vertical-cavity surface-emitting lasers; Fresnel reflection; Gallium arsenide; Gratings; Integrated optics; Monolithic integrated circuits; Optical diffraction; Resists; Stimulated emission; Surface emitting lasers; Vertical cavity surface emitting lasers;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.807906
