DocumentCode
1155225
Title
An analytical two-dimensional simulation for the GaAs MESFET drain-induced barrier lowering: a short-channel effect
Author
Chang, Chian-Sern ; Day, Ding-yuan S. ; Chan, Simon
Author_Institution
Avantek Inc., Santa Clara, CA, USA
Volume
37
Issue
5
fYear
1990
fDate
5/1/1990 12:00:00 AM
Firstpage
1182
Lastpage
1186
Abstract
An analytic model for simulating the GaAs MESFET drain-induced barrier lowering and its effect on device performance are discussed. The potential barrier between the source and drain of a field-effect transistor in or near the subthreshold region is lowered by increasing the drain voltage. As the barrier is lowered to be comparable to the thermal energy, an appreciable current will flow through the channel, and the device will begin to conduct. This effect causes the threshold-voltage-control problem and degrades the device performance
Keywords
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; semiconductor device models; GaAs; GaAs MESFET; analytical two-dimensional simulation; drain voltage; drain-induced barrier lowering; model; performance degradation; potential barrier; short-channel effect; subthreshold region; threshold-voltage-control problem; Analytical models; Boundary conditions; Buffer layers; FETs; Gallium arsenide; MESFETs; Performance analysis; Poisson equations; Thermal conductivity; Threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/16.108177
Filename
108177
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