• DocumentCode
    1155225
  • Title

    An analytical two-dimensional simulation for the GaAs MESFET drain-induced barrier lowering: a short-channel effect

  • Author

    Chang, Chian-Sern ; Day, Ding-yuan S. ; Chan, Simon

  • Author_Institution
    Avantek Inc., Santa Clara, CA, USA
  • Volume
    37
  • Issue
    5
  • fYear
    1990
  • fDate
    5/1/1990 12:00:00 AM
  • Firstpage
    1182
  • Lastpage
    1186
  • Abstract
    An analytic model for simulating the GaAs MESFET drain-induced barrier lowering and its effect on device performance are discussed. The potential barrier between the source and drain of a field-effect transistor in or near the subthreshold region is lowered by increasing the drain voltage. As the barrier is lowered to be comparable to the thermal energy, an appreciable current will flow through the channel, and the device will begin to conduct. This effect causes the threshold-voltage-control problem and degrades the device performance
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; semiconductor device models; GaAs; GaAs MESFET; analytical two-dimensional simulation; drain voltage; drain-induced barrier lowering; model; performance degradation; potential barrier; short-channel effect; subthreshold region; threshold-voltage-control problem; Analytical models; Boundary conditions; Buffer layers; FETs; Gallium arsenide; MESFETs; Performance analysis; Poisson equations; Thermal conductivity; Threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.108177
  • Filename
    108177