DocumentCode
1156654
Title
Applied optical diagnostics of semiconductors
Author
Fauchet, Philippe M.
Author_Institution
Dept. of Electr. Eng., Rochester Univ., NY, USA
Volume
80
Issue
3
fYear
1992
fDate
3/1/1992 12:00:00 AM
Firstpage
420
Lastpage
435
Abstract
Optical techniques are finding an increasing number of applications for the characterization of semiconductor materials and devices. An introduction to this field is given, starting with a review of the principles behind the most popular techniques. The techniques are illustrated by examining specific examples of technological importance taken from the recent literature. They include several examples of identification of materials, mapping of wafers with high spatial resolution, and in-situ probing of growth and of device operation
Keywords
luminescence of solids; optical harmonic generation; photoluminescence; reflectivity; semiconductors; device operation; in-situ probing; material identification; optical diagnostics; semiconductor devices; semiconductor materials; spatial resolution; wafer mapping; Absorption; Laser fusion; Materials testing; Optical devices; Optical materials; Optical refraction; Optical scattering; Semiconductor device manufacture; Semiconductor materials; Spatial resolution;
fLanguage
English
Journal_Title
Proceedings of the IEEE
Publisher
ieee
ISSN
0018-9219
Type
jour
DOI
10.1109/5.135358
Filename
135358
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