DocumentCode :
1156654
Title :
Applied optical diagnostics of semiconductors
Author :
Fauchet, Philippe M.
Author_Institution :
Dept. of Electr. Eng., Rochester Univ., NY, USA
Volume :
80
Issue :
3
fYear :
1992
fDate :
3/1/1992 12:00:00 AM
Firstpage :
420
Lastpage :
435
Abstract :
Optical techniques are finding an increasing number of applications for the characterization of semiconductor materials and devices. An introduction to this field is given, starting with a review of the principles behind the most popular techniques. The techniques are illustrated by examining specific examples of technological importance taken from the recent literature. They include several examples of identification of materials, mapping of wafers with high spatial resolution, and in-situ probing of growth and of device operation
Keywords :
luminescence of solids; optical harmonic generation; photoluminescence; reflectivity; semiconductors; device operation; in-situ probing; material identification; optical diagnostics; semiconductor devices; semiconductor materials; spatial resolution; wafer mapping; Absorption; Laser fusion; Materials testing; Optical devices; Optical materials; Optical refraction; Optical scattering; Semiconductor device manufacture; Semiconductor materials; Spatial resolution;
fLanguage :
English
Journal_Title :
Proceedings of the IEEE
Publisher :
ieee
ISSN :
0018-9219
Type :
jour
DOI :
10.1109/5.135358
Filename :
135358
Link To Document :
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