DocumentCode
1157953
Title
Quantum interference in fully depleted tri-gate quantum-wire transistors-the role of inelastic scattering
Author
Gilbert, Matthew J. ; Ferry, David K.
Author_Institution
Dept. of Electr. Eng., Arizona State Univ., Tempe, AZ, USA
Volume
4
Issue
5
fYear
2005
Firstpage
599
Lastpage
604
Abstract
Within the next decade, it is predicted that we will reach the limits of silicon scaling as it is currently defined. Of the new devices under investigation, one of the most promising is the tri-gate quantum-wire transistor. In this paper, we study the role quantum interference plays in the operation of this device both in the ballistic and quasi-ballistic regimes. We find that, in the ballistic case, the electrons propagating in the system tend to form vortices in their motion when subjected to moderate drain biases. These vortices form in both the source and drain of the device when the proper conditions are satisfied. Further, we observe fluctuations in the conductance of the device, which leads to fluctuations in resultant drain current due to interactions with the channel and dopant ions. When inelastic scattering is considered, the formation of the vortices is suppressed and the spread in threshold voltage fluctuations is reduced. However, the conductance fluctuations remain in the drain current once the drain voltage reaches larger values.
Keywords
MOSFET; doping; elemental semiconductors; quantum interference devices; semiconductor quantum wires; silicon; vortices; MOSFET; Si; channel-dopant ion interactions; conductance fluctuations; drain current; drain voltage; electron propagation; inelastic scattering; quantum interference; quasiballistic regimes; silicon scaling; threshold voltage fluctuations; trigate quantum-wire transistors; vortices; CMOS technology; Electrons; Fluctuations; Interference; Lattices; MOSFET circuits; Particle scattering; Silicon on insulator technology; Threshold voltage; Wire; Inelastic scattering; MOSFET; quantum interference; quantum wire; silicon; tri-gate; vorticity;
fLanguage
English
Journal_Title
Nanotechnology, IEEE Transactions on
Publisher
ieee
ISSN
1536-125X
Type
jour
DOI
10.1109/TNANO.2005.851429
Filename
1504720
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