DocumentCode :
1160193
Title :
A Comparison of MISiC Schottky-Diode Hydrogen Sensors Made by NO, \\hbox {N}_{2}\\hbox {O} , or \\hbox {NH}_{3} Nitridations
Author :
Tang, W.M. ; Lai, P.T. ; Leung, C.H. ; Xu, J.P.
Author_Institution :
Dept. of Electr. & Electron. Eng., Hong Kong Univ.
Volume :
53
Issue :
9
fYear :
2006
Firstpage :
2378
Lastpage :
2383
Abstract :
MISiC Schottky-diode hydrogen sensors with gate insulator grown in three different nitridation gases (nitric oxide (NO), N2O, and NH3) are fabricated. Steady-state and transient-response measurements are carried out at different temperatures and hydrogen concentrations using a computer-controlled measurement system. Experimental results show that these nitrided sensors have high sensitivity and can give a rapid and stable response over a wide range of temperature. This paper also finds that N2O provides the fastest insulator growth with good insulator quality and hence the highest sensitivity among the three nitrided samples. The N2O-nitrided sensor can give a significant response even at a low H2 concentration of 48-ppm H2 in N2, indicating a potential application for detecting hydrogen leakage at high temperature. Moreover, the three nitrided samples respond faster than the control sample. At 300 degC, the response times of the N2O, NO, and NH3-nitrided sample to the 48-ppm H2 in N2 are 11, 11, and 37 s, respectively, as compared to 65 s for the control sample without the gate insulator
Keywords :
Schottky diodes; ammonia; chemical variables measurement; gas sensors; hydrogen; nitridation; silicon compounds; transient response; 300 C; H2; MISiC Schottky-diode; N2O; NH3; NO; SiC; computer-controlled measurement system; hydrogen concentration; hydrogen sensors; nitridation gases; steady-state measurements; transient-response measurements; Delay; Gas insulation; Gases; Hydrogen; NASA; Silicon carbide; Stability; Steady-state; Temperature distribution; Temperature sensors; Hydrogen sensors; nitridation; silicon carbide;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2006.879676
Filename :
1677878
Link To Document :
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