Title :
SIMPL-2: (SIMulated Profiles from the Layout-Version 2)
Author :
Lee, Keunmyung ; Neureuther, Andrew R.
Author_Institution :
Dept. of Electr. Eng., California Univ., Berkeley, CA, USA
fDate :
2/1/1988 12:00:00 AM
Abstract :
SIMPL is a computer-aided-design (CAD) tool for simulating the cross-sectional profile of integrated circuits along an arbitrary cut-line drawn on the layout. The linked-list arbitrary polygonal data structure, process specification file, physical process algorithms, graphics display interface, and linking to external rigorous process simulators of SIMPL-2 are described. SIMPL-2 is capable of displaying in color two-dimensional process effects such as the bird´s-beak, lateral diffusion, undercut in etching, and sidewall coverage in deposition, based on its linked-polygonal and grid-type databases. The device profile from the composite can be generated rapidly in several minutes on a VAX 11/780 using elementary internal physical process models. SIMPL-2 can also invoke more rigorous external process simulators through an interface for profile data and transfer of control, providing a heretofore missing link between layout-based CAD tools and process and device simulators
Keywords :
circuit layout CAD; monolithic integrated circuits; CAD tool; SIMPL-2; VAX 11/780; bird´s-beak; cross-sectional profile; device profile; etching undercut; graphics display interface; integrated circuits; lateral diffusion; layout; linked-list arbitrary polygonal data structure; physical process algorithms; process simulators; process specification file; sidewall coverage; two-dimensional process effects; Circuit simulation; Color; Computational modeling; Computer displays; Computer graphics; Computer simulation; Data structures; Etching; Integrated circuit layout; Joining processes;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
