Title :
Numerical modeling of glass flow and spin-on planarization
Author :
Leon, Francisco A.
Author_Institution :
Intel Corp., Santa Clara, CA, USA
fDate :
2/1/1988 12:00:00 AM
Abstract :
A model for the flow of phosphosilicate glass (PSG) and borophosphosilicate glass (BPSG) has been developed and integrated into the SAMPLE process simulation program. The physical basis of the model is the deformation of the glass in such a way as to decrease the surface free energy; the kinetics of the deformation are assumed to be controlled by a surface diffusion process. The model is applicable to 2-D and quasi-3-D (cylindrically symmetric) structures. In addition, a related model has been developed for spin-on glass, polyimide, and photoresist. The theory of these models is discussed, and examples of simulations using these models are presented
Keywords :
borosilicate glasses; electronic engineering computing; non-Newtonian flow; phosphosilicate glasses; semiconductor technology; surface diffusion; 2D structures; B2O3-P2O5-SiO2; BPSG; P2O5-SiO2; PSG; SAMPLE process simulation program; borophosphosilicate glass; glass flow; numerical modelling; phosphosilicate glass; photoresist; polyimide; quasi-3D structures; spin-on planarization; surface diffusion; surface free energy; Deformable models; Diffusion processes; Glass; Kinetic theory; Lithography; Numerical models; Planarization; Polyimides; Resists; Semiconductor device modeling; Surface topography;
Journal_Title :
Computer-Aided Design of Integrated Circuits and Systems, IEEE Transactions on
