• DocumentCode
    1162164
  • Title

    A figure of merit for the high-frequency noise behavior of bipolar transistors

  • Author

    de Vreede, L.C.N. ; de Graaff, H.C. ; Hurkx, G.A.M. ; Tauritz, J.L. ; Baets, R.G.F.

  • Author_Institution
    Dept. of Electr. Eng., Delft Univ. of Technol., Netherlands
  • Volume
    29
  • Issue
    10
  • fYear
    1994
  • fDate
    10/1/1994 12:00:00 AM
  • Firstpage
    1220
  • Lastpage
    1226
  • Abstract
    In this paper a new figure of merit for high frequency noise behavior for use in the evaluation and development of bipolar silicon process technology is introduced. Basic low noise design rules for optimum transistor biasing and emitter scaling are proposed
  • Keywords
    bipolar transistors; elemental semiconductors; equivalent circuits; semiconductor device models; semiconductor device noise; silicon; HF noise; Si; bipolar Si process technology; bipolar transistors; figure of merit; high-frequency noise behavior; low noise design rules; optimum emitter scaling; optimum transistor biasing; Bipolar transistors; Circuit noise; Frequency; Geometry; Integrated circuit noise; Laboratories; Magneto electrical resistivity imaging technique; Noise figure; Signal to noise ratio; Silicon;
  • fLanguage
    English
  • Journal_Title
    Solid-State Circuits, IEEE Journal of
  • Publisher
    ieee
  • ISSN
    0018-9200
  • Type

    jour

  • DOI
    10.1109/4.315206
  • Filename
    315206