DocumentCode :
1163559
Title :
Effect of bulk recombination current on the current gain of GaAs/AlGaAs heterojunction bipolar transistors in GaAs-on-Si
Author :
Ma, Tony ; Lee, Won-Seong ; Adkisson, James W. ; Harris, James S., Jr.
Author_Institution :
Stanford Electron. Lab., Stanford Univ., CA, USA
Volume :
10
Issue :
10
fYear :
1989
Firstpage :
458
Lastpage :
460
Abstract :
The effect of bulk recombination current on the current gain of heterojunction bipolar transistors (HBTs) in GaAs-on-Si has been studied. A thin AlGaAs emitter layer is used to prevent an exposed extrinsic base region, which has previously masked the effect of the bulk recombination current on the current gain in HBTs. It is found that once the surface recombination current is removed, the current grain due to bulk recombination alone is approximately ten times lower for the HBTs in GaAs-on-Si than for HBTs in GaAs. The difference in the current gain is probably due to electrically active dislocations in the base in the HBTs in GaAs-on-Si, where the density is about 10/sup 8/ cm/sup -2/ as measured by transmission electron microscopy.<>
Keywords :
III-V semiconductors; aluminium compounds; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; transmission electron microscope examination of materials; GaAs-AlGaAs; GaAs-Si; HBTs; bulk recombination current; current gain; electrically active dislocations; exposed extrinsic base region; heterojunction bipolar transistors; surface recombination current; transmission electron microscopy; Current measurement; Density measurement; Electric variables measurement; Gain measurement; Gallium arsenide; Heterojunction bipolar transistors; Transmission electron microscopy;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.43099
Filename :
43099
Link To Document :
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