Title :
Distributed Bragg feedback intensity modulator in Ti:LiNbO3
Author :
Kim, R. ; Zhang, J. ; Eknoyan, O. ; Taylor, H.F. ; Smith, T.L.
Author_Institution :
Dept. of Electr. Eng., Texas A&M Univ., College Station, TX, USA
Abstract :
A distributed feedback electro-optic intensity modulator in Ti:LiNbO3, utilising Bragg reflectors etched in an amorphous Si overlay film, is demonstrated. A maximum modulation depth of 94% is realised at an operating wavelength of 1542 nm.
Keywords :
distributed Bragg reflectors; intensity modulation; lithium compounds; silicon; titanium; 1542 nm; Bragg reflector; LiNbO3:Ti; amorphous overlay film; distributed Bragg feedback intensity modulator; electro-optic intensity modulator; modulation depth;
Journal_Title :
Electronics Letters
DOI :
10.1049/el:20052450