Title :
Style context with second-order statistics
Author :
Veeramachaneni, Sriharsha ; Nagy, George
Author_Institution :
Autom. Reasoning Div., Ist. per la Ricerca Sci. e Tecnologica, Trento, Italy
Abstract :
Patterns often occur as homogeneous groups or fields generated by the same source. In multisource recognition problems, such isogeny induces statistical dependencies between patterns (termed style context). We model these dependencies by second-order statistics and formulate the optimal classifier for normally distributed styles. We show that model parameters estimated only from pairs of classes suffice to train classifiers for any test field length. Although computationally expensive, the style-conscious classifier reduces the field error rate by up to 20 percent on quadruples of handwritten digits from standard NIST data sets.
Keywords :
handwritten character recognition; parameter estimation; pattern classification; statistical analysis; distributed styles; field error rate reduction; handwritten digits; homogeneous groups; multisource recognition; optimal classifier; parameter estimation; pattern classification; pattern style context; second order statistics; statistical dependencies; style conscious classifier; Context modeling; Data mining; Error analysis; NIST; Parameter estimation; Pattern recognition; Statistical distributions; Statistics; Testing; Text recognition; Index Terms- Interpattern feature dependence; continuous styles; quadratic discriminant classifier.; writer consistency; Algorithms; Artificial Intelligence; Automatic Data Processing; Computer Graphics; Discriminant Analysis; Documentation; Handwriting; Image Interpretation, Computer-Assisted; Information Storage and Retrieval; Models, Statistical; Numerical Analysis, Computer-Assisted; Pattern Recognition, Automated; Reading; Reproducibility of Results; Sensitivity and Specificity; Signal Processing, Computer-Assisted; Subtraction Technique; User-Computer Interface;
Journal_Title :
Pattern Analysis and Machine Intelligence, IEEE Transactions on
DOI :
10.1109/TPAMI.2005.19