DocumentCode :
1165098
Title :
An ON-resistance closed form for VDMOS devices
Author :
Fernández, J. ; Hidalgo, S. ; Paredes, J. ; Berta, F. ; Rebollo, J. ; Millán, J. ; Serra-Mestres, Francisco
Author_Institution :
Centro Nacional de Microelectron., Univ. Autonoma de Barcelona, Spain
Volume :
10
Issue :
5
fYear :
1989
fDate :
5/1/1989 12:00:00 AM
Firstpage :
212
Lastpage :
215
Abstract :
An analytical ON-resistance expression for different designs of VDMOS (vertically diffused metal-oxide-semiconductor) devices which takes into consideration the two-dimensional (2-D) nature of the current flow is obtained. This expression differs from other models that overestimate this resistance for large cell spacings. This formulation is in close agreement with experimental points obtained from the interdigitated fabricated structures and with 2-D simulations. Moreover, the effect of a two-level oxide thickness on the ON resistance has been investigated for the interdigitated case.<>
Keywords :
insulated gate field effect transistors; metal-insulator-semiconductor devices; power transistors; semiconductor device models; 2D current flow; 2D simulation; ON-resistance closed form; VDMOS devices; interdigitated fabricated structures; models; power transistors; two-level oxide thickness; Conductivity; Contact resistance; Current distribution; Differential equations; Electrodes; Geometry; Immune system; Surface resistance;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/55.31724
Filename :
31724
Link To Document :
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