Title :
Modeling of currents in a vertical p-n-p transistor with extremely shallow emitter
Author :
Lu, Pong-Fei ; Chen, Tze-Chiang ; Saccomango, M.J.
Author_Institution :
IBM, Thomas J. Watson Res. Center, Yorktown Heights, NY, USA
fDate :
5/1/1989 12:00:00 AM
Abstract :
Detailed simulations of the collector current in a vertical poly-emitter p-n-p transistor have been carried out to verify the minority-hole mobility model of S.E. Swirhun et al. (ibid., vol.7, no.3, p.168-71, 1986). The simulations were based on the SIMS profile, incorporating all published physical parameters, and the results showed good agreement with the measurements for base doping ranging from 10/sup 18/ to 10/sup 19/ cm/sup -3/. In addition, the effective surface recombination velocity of electrons at the p/sup +/ poly/Si interface was found by fitting the measured base current to be approximately 1.4*10/sup 5/ cm/s, which is comparable to its n-p-n counterpart.<>
Keywords :
bipolar transistors; carrier mobility; electron-hole recombination; minority carriers; semiconductor device models; SIMS profile; base current; base doping; collector current; extremely shallow emitter; minority-hole mobility model; modelling; simulations; surface recombination velocity; vertical p-n-p transistor; Annealing; Current density; Doping profiles; Electrical resistance measurement; Electrons; Etching; Semiconductor process modeling; Spontaneous emission; Surface fitting; Temperature;
Journal_Title :
Electron Device Letters, IEEE