DocumentCode :
1166274
Title :
Ultra-High-Speed Deeply Etched Electrooptic Polymer Modulator With Profiled Cross Section
Author :
Gorman, T. ; Haxha, S. ; Ju, J.J.
Author_Institution :
Dept. of Electron., Univ. of Kent, Canterbury
Volume :
27
Issue :
1
fYear :
2009
Firstpage :
68
Lastpage :
76
Abstract :
In this paper, we present a novel ultra-high-speed polymer based electrooptic modulator that features a profiled, deeply etched cross section. We show that by profiling the side walls of the modulator and varying the thickness of the dielectric stack that broadband operation can be achieved whilst maintaining a very low drive voltage in a compact device. Initially a quasi-TEM analysis is undertaken in order to determine the modulators response to topographical variation followed by a full-wave analysis on the optimized device. The full-wave analysis is employed in order to determine any frequency dispersion effects with respect to the modulators characteristic impedance Zc, microwave effective index Nm, microwave and dielectric losses alphac and alphad , and the half-wave voltage-length product V pi L.
Keywords :
Mach-Zehnder interferometers; electro-optical modulation; etching; high-speed optical techniques; microwave photonics; optical communication equipment; optical fabrication; optical polymers; dielectric stack thickness variation; electrooptic polymer modulator; frequency dispersion effect; full-wave analysis; quasiTEM analysis; quasitransverse-electromagnetic analysis; ultra-high-speed deeply etched modulator; Dielectric devices; Dielectric losses; Dispersion; Electrooptic modulators; Etching; Frequency; Impedance; Low voltage; Microwave devices; Polymers; Full-wave; integrated optics; optical communications; polymer electrooptic modulator;
fLanguage :
English
Journal_Title :
Lightwave Technology, Journal of
Publisher :
ieee
ISSN :
0733-8724
Type :
jour
DOI :
10.1109/JLT.2008.929413
Filename :
4785408
Link To Document :
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