• DocumentCode
    1167664
  • Title

    Extraction of electronic transport parameters in submicrometer gate-length MODFET´s

  • Author

    Fu, Shih-Tsang ; Das, Makunda B.

  • Author_Institution
    Pennsylvania State Univ., University Park, PA, USA
  • Volume
    38
  • Issue
    8
  • fYear
    1991
  • fDate
    8/1/1991 12:00:00 AM
  • Firstpage
    1719
  • Lastpage
    1729
  • Abstract
    A systematic measurement scheme is developed for the extraction of the intrinsic electronic transport parameters of submicrometer-gate-length modulation-doped field-effect transistors (MODFETs). These parameters include the intrinsic gate-to-channel capacitance and the channel sheet carrier concentration, under low-drain-voltage bias, and the channel carrier transit time, in the current-saturation mode of device operation. The extraction methods are based on independent measurements of low-field and high-field electronic transport parameters. Experimental results obtained from 0.25-μm gate-length pseudomorphic and conventional MODFETs clearly demonstrate the self-consistency of the methods
  • Keywords
    high electron mobility transistors; semiconductor device models; 0.25 micron; MODFETs; channel carrier transit time; channel sheet carrier concentration; current-saturation mode; gate-to-channel capacitance; high-field electronic transport parameters; independent measurements; intrinsic electronic transport parameters; low field electronic transport parameters; low-drain-voltage bias; modulation-doped field-effect transistors; parameter extraction; pseudomorphic MODFETs; self-consistency; submicrometer gate-length; submicron gates; systematic measurement scheme; Collaborative work; Electron traps; Epitaxial layers; FETs; Gallium arsenide; HEMTs; Indium gallium arsenide; MODFETs; Parasitic capacitance; Voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/16.119006
  • Filename
    119006