DocumentCode :
1167883
Title :
Analysis of delta-doped and uniformly doped AlGaAs/GaAs HEMT´s by ensemble Monte Carlo simulations
Author :
Kim, Ki Wook ; Tian, Hong ; Littlejohn, Michael A.
Author_Institution :
Dept. of Electr. & Comput. Eng., North Carolina State Univ., Raleigh, NC, USA
Volume :
38
Issue :
8
fYear :
1991
fDate :
8/1/1991 12:00:00 AM
Firstpage :
1737
Lastpage :
1742
Abstract :
Transport properties and device performance of delta-doped and uniformly doped AlGaAs/GaAs high electron mobility transistors (HEMTs) with identical threshold voltages and gate capacitors are investigated using two-dimensional self-consistent ensemble Monte Carlo simulations. The model includes the effects of real-space transfer and carrier degeneracy, as well as the influence of DX centers and surface states. A one-to-one comparison of simulation results for the two devices demonstrates superior performance for the delta-doped HEMT and provides a physical basis for the observed improvements. In particular, the delta-doped HEMT maintains its superior device performance as gate bias is increased. Reasons for these improvements are reported
Keywords :
III-V semiconductors; Monte Carlo methods; aluminium compounds; gallium arsenide; high electron mobility transistors; semiconductor device models; semiconductor doping; 2D model; AlGaAs-GaAs; DX centers; HEMTs; carrier degeneracy; delta-doped HEMT; device performance; effects of real-space transfer; ensemble Monte Carlo simulations; gate capacitors; high electron mobility transistors; physical basis; semiconductors; surface states; threshold voltages; transport properties; uniformly doped HEMT; Capacitors; Electron mobility; Gallium arsenide; HEMTs; Helium; MESFETs; MODFETs; Microwave devices; Threshold voltage; Transconductance;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/16.119008
Filename :
119008
Link To Document :
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