Title :
Fabrication and performance of parallel-addressed InGaN micro-LED arrays
Author :
Choi, H.W. ; Jeon, C.W. ; Dawson, M.D. ; Edwards, P.R. ; Martin, R.W.
Author_Institution :
Inst. of Photonics, Univ. of Strathclyde, Glasgow, UK
fDate :
4/1/2003 12:00:00 AM
Abstract :
High-performance, two-dimensional arrays of parallel-addressed InGaN blue micro-light-emitting diodes (LEDs) with individual element diameters of 8, 12, and 20 μm, respectively, and overall dimensions 490 ×490 μm, have been fabricated. In order to overcome the difficulty of interconnecting multiple device elements with sufficient step-height coverage for contact metallization, a novel scheme involving the etching of sloped-sidewalls has been developed. The devices have current-voltage (I-V) characteristics approaching those of broad-area reference LEDs fabricated from the same wafer, and give comparable (3-mW) light output in the forward direction to the reference LEDs, despite much lower active area. The external efficiencies of the micro-LED arrays improve as the dimensions of the individual elements are scaled down. This is attributed to scattering at the etched sidewalls of in-plane propagating photons into the forward direction.
Keywords :
III-V semiconductors; gallium compounds; indium compounds; light emitting diodes; light scattering; optical arrays; optical interconnections; 12 micron; 20 micron; 490 micron; 8 micron; InGaN; broad-area reference LEDs; contact metallization; current-voltage characteristics; etching; external efficiencies; forward direction; in-plane propagating photons; individual element diameters; light scattering; micro-LED arrays; multiple device elements; overall dimensions; parallel-addressed InGaN blue micro LEDs; parallel-addressed InGaN blue micro-light-emitting diodes; sloped-sidewalls; step-height coverage; two-dimensional arrays; wafer; Etching; Fabrication; Gallium nitride; Light emitting diodes; Light scattering; Metallization; Plasma applications; Plasma devices; Plasma materials processing; Plasma temperature;
Journal_Title :
Photonics Technology Letters, IEEE
DOI :
10.1109/LPT.2003.809257