Title :
Effect of side wall roughness in buried channel waveguides
Author :
Ladouceur, F. ; Love, J.D. ; Senden, T.J.
Author_Institution :
CEA-Technol. Avancees, Grenoble, France
fDate :
8/1/1994 12:00:00 AM
Abstract :
An atomic force microscope is employed to measure the edge roughness of masks used in the fabrication of rectangular-core buried channel waveguides (BCWs) and to compare this with the corresponding roughness of the etched BCWs. Light attenuation due to scattering loss from the sides of the core can then be estimated using a simple statistical model to process the measured data
Keywords :
atomic force microscopy; etching; integrated optics; light scattering; masks; optical losses; optical waveguides; surface topography measurement; atomic force microscope; buried channel waveguides; edge roughness; etched BCWs; light attenuation; masks; measured data; rectangular-core buried channel waveguide fabrication masks; scattering loss; side wall roughness; statistical model;
Journal_Title :
Optoelectronics, IEE Proceedings -
DOI :
10.1049/ip-opt:19941085
