Title :
Overview of CMOS Technology Development in the MIRAI Project
Author :
Masuhara, Toshiaki ; Hirose, Masataka
Author_Institution :
MIRAI, t-masuhara@mirai.aist.go.jp
Abstract :
Funded by the New Energy and Industrial Technology Development Organization, the Millennium Research for Advanced Information Technology Project (MIRAI) provided technology solutions for the half-pitch 65nm technology node in its 1st Phase (2001-2003), and half-pitch 45nm and beyond in its 2nd Phase(2004-2007). Phase 3 will provide technical solutions for ultrascaled CMOS, nano-silicon integration and EUV lithography.
Keywords :
CMOS integrated circuits; Data mining; Delay; Dielectrics; Logic gates; MOSFET circuits; Silicon;
Journal_Title :
Solid-State Circuits Society Newsletter, IEEE
DOI :
10.1109/N-SSC.2006.4785854
