Title :
Lithography and the Future of Moore's Law, Copyright 1995 IEEE. Reprinted with permission. Proc. SPIE Vol. 2437, pp. 2–17
Author :
Moore, Gordon E.
Author_Institution :
Co-founder Intel Corporation
Abstract :
Semiconductor technology has made its great strides as a result of ever increasing complexity of the products produced exploiting higher and higher density to a considerable extent the result of progress in lithography. This article reviews the history and past performance of Moore´s Law relative to predictions and shows where the advances have come from.
Keywords :
Charge coupled devices; Complexity theory; Industries; Integrated circuits; International Electron Devices Meeting; Random access memory; Transistors;
Journal_Title :
Solid-State Circuits Society Newsletter, IEEE
DOI :
10.1109/N-SSC.2006.4785861
