• DocumentCode
    1170621
  • Title

    Operation voltage dependence of memory cell characteristics in fully depleted floating-body cell

  • Author

    Shino, Tomoaki ; Ohsawa, Takashi ; Higashi, Tomoki ; Fujita, Katsuyuki ; Kusunoki, Naoki ; Minami, Yoshihiro ; Morikado, Mutsuo ; Nakajima, Hiroomi ; Inoh, Kazumi ; Hamamoto, Takeshi ; Nitayama, Akihiro

  • Author_Institution
    SoC R&D Center, Toshiba Corp., Yokohama, Japan
  • Volume
    52
  • Issue
    10
  • fYear
    2005
  • Firstpage
    2220
  • Lastpage
    2226
  • Abstract
    A one-transistor memory cell on silicon-on-insulator, called floating-body cell (FBC), has been developed and demonstrated. Threshold voltage difference between the "0"-state and the "1"-state, which is a key parameter for realizing a large-scale memory by FBCs, is measured and analyzed using a 96 kb array diagnostic monitor (ADM). A function test of the ADM yielded a fail-bit probability of 0.002%. A new metric relating to the fail-bit probability, that is, the ratio of the threshold voltage difference over the total threshold voltage variation, is introduced and applied to the measurement results. Read current distributions are also evaluated for various operation voltages. This paper also investigates substrate bias dependence of the threshold voltage unique to fully-depleted devices. Channel impurity and substrate impurity concentration dependence of the threshold voltage are analyzed based on experimental data and device simulation.
  • Keywords
    MOS memory circuits; current distribution; impurity distribution; random-access storage; silicon-on-insulator; array diagnostic monitor; channel impurity concentration dependence; fail-bit probability; fully depleted floating-body cell; large-scale memory; memory cell characteristics; one-transistor memory cell; operation voltage dependence; read current distribution; silicon-on-insulator; substrate bias dependence; substrate impurity concentration dependence; Analytical models; Boron; Current distribution; Fabrication; Impurities; Large-scale systems; MOSFETs; Silicon on insulator technology; Substrates; Threshold voltage; Distribution; MOSFETs; random access memories; silicon-on-insulator (SOI) technology; threshold voltage;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2005.856808
  • Filename
    1510912