DocumentCode
1170621
Title
Operation voltage dependence of memory cell characteristics in fully depleted floating-body cell
Author
Shino, Tomoaki ; Ohsawa, Takashi ; Higashi, Tomoki ; Fujita, Katsuyuki ; Kusunoki, Naoki ; Minami, Yoshihiro ; Morikado, Mutsuo ; Nakajima, Hiroomi ; Inoh, Kazumi ; Hamamoto, Takeshi ; Nitayama, Akihiro
Author_Institution
SoC R&D Center, Toshiba Corp., Yokohama, Japan
Volume
52
Issue
10
fYear
2005
Firstpage
2220
Lastpage
2226
Abstract
A one-transistor memory cell on silicon-on-insulator, called floating-body cell (FBC), has been developed and demonstrated. Threshold voltage difference between the "0"-state and the "1"-state, which is a key parameter for realizing a large-scale memory by FBCs, is measured and analyzed using a 96 kb array diagnostic monitor (ADM). A function test of the ADM yielded a fail-bit probability of 0.002%. A new metric relating to the fail-bit probability, that is, the ratio of the threshold voltage difference over the total threshold voltage variation, is introduced and applied to the measurement results. Read current distributions are also evaluated for various operation voltages. This paper also investigates substrate bias dependence of the threshold voltage unique to fully-depleted devices. Channel impurity and substrate impurity concentration dependence of the threshold voltage are analyzed based on experimental data and device simulation.
Keywords
MOS memory circuits; current distribution; impurity distribution; random-access storage; silicon-on-insulator; array diagnostic monitor; channel impurity concentration dependence; fail-bit probability; fully depleted floating-body cell; large-scale memory; memory cell characteristics; one-transistor memory cell; operation voltage dependence; read current distribution; silicon-on-insulator; substrate bias dependence; substrate impurity concentration dependence; Analytical models; Boron; Current distribution; Fabrication; Impurities; Large-scale systems; MOSFETs; Silicon on insulator technology; Substrates; Threshold voltage; Distribution; MOSFETs; random access memories; silicon-on-insulator (SOI) technology; threshold voltage;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2005.856808
Filename
1510912
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