DocumentCode :
1172222
Title :
Extending two-element capacitance extraction method toward ultraleaky gate oxides using a short-channel length
Author :
Jung-Suk Goo ; Mantei, T. ; Wieczorek, K. ; En, W.G. ; Icel, A.B.
Author_Institution :
Technol. Dev. Group of Adv. Micro Devices Inc., Sunnyvale, CA, USA
Volume :
25
Issue :
12
fYear :
2004
Firstpage :
819
Lastpage :
821
Abstract :
This letter demonstrates that the conventional two-element lumped model can provide valid capacitance-voltage (C-V ) characteristics for gate oxides with large tunneling current, if the gate length is reduced. The two-element models generally suffer from severe distortion of C-V due to tunneling current, resulting in poor oxide thickness extraction. The distortion can be suppressed using high frequencies in series model or using short gate lengths in parallel model. Considering instrument limits and manufacturability, however, the parallel model is more desirable. The distortion can be completely suppressed up to 104 A/cm2 of tunneling current, using gate lengths shorter than 0.2 μm in parallel model.
Keywords :
MOSFET; capacitance measurement; tunnelling; MOS devices; MOSFETs; capacitance measurement; capacitance-voltage characteristics; oxide thickness extraction; short-channel length; thin-film capacitors; tunneling current; two-element capacitance extraction; two-element lumped model; ultraleaky gate oxides; Admittance; Capacitance; Capacitance-voltage characteristics; Capacitors; Dielectrics; Frequency; Impedance; Leakage current; MOSFETs; Tunneling; Capacitance measurement; MOS devices; MOSFETs; thin-film capacitors; tunneling;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2004.839209
Filename :
1362786
Link To Document :
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