• DocumentCode
    1173234
  • Title

    Capacitance Oscillations in Cylindrical Nanowire Gate-All-Around MOS Devices at Low Temperatures

  • Author

    Chin, S.K. ; Ligatchev, V.

  • Author_Institution
    Inst. of High Performance Comput., Singapore
  • Volume
    30
  • Issue
    4
  • fYear
    2009
  • fDate
    4/1/2009 12:00:00 AM
  • Firstpage
    395
  • Lastpage
    397
  • Abstract
    The effects of strong transverse confinement on cylindrical nanowire (NW) gate-all-around MOS are studied using a Schrodinger-Poisson simulator with full-quantum treatment. This letter is the first to show numerically that the gate capacitance oscillates toward the geometric limit as the gate voltage increases in the inversion regime for a n-type NW MOS; such oscillations are observed at a low temperature range of 5 K-38 K for an NW radius of 5-8 nm. These oscillating capacitance-voltage characteristics are the direct results of the severe nonuniformity of the electron density of states. In contrast to previous works that used semiclassical or quantum correction approaches, this letter demonstrates that full-quantum treatment is needed to observe these capacitance oscillations.
  • Keywords
    MIS devices; Schrodinger equation; capacitance; nanowires; oscillations; Schrodinger-Poisson simulator; capacitance oscillations; cylindrical nanowire gate-all-around MOS devices; full-quantum treatment; oscillating capacitance-voltage characteristics; temperature 5 K to 38 K; transverse confinement; Gate all around; MOS; Schrodinger–Poisson (SP); nanowire (NW);
  • fLanguage
    English
  • Journal_Title
    Electron Device Letters, IEEE
  • Publisher
    ieee
  • ISSN
    0741-3106
  • Type

    jour

  • DOI
    10.1109/LED.2009.2013975
  • Filename
    4787037